| dc.contributor.author |
Kerber, S |
en |
| dc.contributor.author |
Barr, T |
en |
| dc.contributor.author |
Mann, G |
en |
| dc.contributor.author |
Brantley, W |
en |
| dc.contributor.author |
Papazoglou, E |
en |
| dc.contributor.author |
Mitchell, J |
en |
| dc.date.accessioned |
2014-06-06T06:43:33Z |
|
| dc.date.available |
2014-06-06T06:43:33Z |
|
| dc.date.issued |
1998 |
en |
| dc.identifier.uri |
http://dx.doi.org/10.1361/105994998770347765 |
en |
| dc.identifier.uri |
http://62.217.125.90/xmlui/handle/123456789/1367 |
|
| dc.subject |
X Ray Diffraction |
en |
| dc.subject |
X Ray Photoelectron Spectroscopy |
en |
| dc.title |
The complementary nature of x-ray photoelectron spectroscopy and angle-resolved x-ray diffraction Part I: Background and theory |
en |
| heal.type |
journalArticle |
en |
| heal.identifier.primary |
10.1361/105994998770347765 |
en |
| heal.publicationDate |
1998 |
en |
| heal.abstract |
X-ray photoelectron spectroscopy (XPS) and x-ray diffraction (XRD) are often used to analyze the surface of complex oxide materials. When XRD is used in an atypical angle resolved x-ray diffraction (ARXRD) mode, crystalline composition as a function of depth can be obtained. Similarly, when XPS is used in conjunction with argon depth profiling, composition as a function of depth can |
en |
| heal.journalName |
Journal of Materials Engineering and Performance |
en |
| dc.identifier.doi |
10.1361/105994998770347765 |
en |